The medium-sized alpha400P arc PVD coating system unites flexibility and a high level of throughput. The system, which was developed as a fast-cycle compact system, is a coating system which is easy to operate with high deposition rates. As well as the deposit of hard coatings, the system is also used for in-situ plasma nitriding. The utilization of the SPCS technology for coatings which satisfy extremely high demands on smoothness and density is likewise possible.
The alpha400P is planned for employment in the following areas:
Technology
The results of long-standing technology development as well as a continuous communication exchange with users are integrated into the development of this system generation.
By means of eifeler-PVD technology, the following layers can be deposited reliably and in high quality on the systems:
Technique
Powerful vacuum pumps and strong radiation heaters guarantee a rapid conditioning of the tools and therefore short cycle times. The compact housing enables easy access to all important components. An optional plasma source for plasma nitriding and also the equipment with SPCS for the manufacture of “ultrafine” layers are extension possibilities for the alpha400P.
Batching system
The easy-to-use batching system allows the operator an optimal and reliable operating mode. voestalpine eifeler Vacotec offers a comprehensive program of batching means which can be used in all machines. Regardless of whether it involves cover sleeves for shaft tools, plug holders or rotation cups: We have a catalogue which is based on more than 25 years of experience in job coating.
Maintenance and service
The large chamber door offers optimum access for cleaning, loading and maintenance. Access to the data during the entire process is possible, as is the remote control for the online maintenance.
Technical data
Substrate | |
Material: | tool steel, HSS, cemented carbide, … |
Tool diameter: | Triple rotation max. Ø 40 mm |
Single rotation max. Ø 450 mm | |
Tool hight: | max. 485 mm |
Load: | max. 300 kg |
Coating chamber | |
Dimensions: | 700 x 775 x 750 mm (L x W x H) |
Vacuum system | |
Rotary vane pump: | 65 m³/h |
Roots pump: | 500 m³/h |
Turbomolecular pump: | 1450 l/s |
Radiant heater | |
Power: | 2 x 10 kW |
Substrate temperature: | up to 500 °C |
2 x thermocouples | |
Bias power supply | |
Power: | 30 kW |
Voltage: | max. 1000 V DC / pulsed DC |
Arc-evaporator | |
Number: | 12 pieces |
Cathode diameter: | Ø 100 mm |
Current per cathode : | max. 125 A |
Power requirements | |
Mains: | TN-S 400/230 VAC / +-10% / 50 or 60 Hz |
Power: | 69 kVA |