General characteristics
The alpha900P PVD coating system represents a new generation of large-volume, arc-coating systems.
High levels of cost-effectiveness due to low-cost consumption materials and rapidly-exchangeable components are only two significant advantages of this PVD system. As well as the deposition of hard wear resistant coatings, the system can optionally be equipped for in-situ plasma nitriding. The utilization of the SPCS technology for coatings, which satisfy extremely high demands on smoothness and density, is likewise possible.
Area of application
The employment of an alpha900P is planned for the following operations:
Technology
The results of long-standing coating and technology development, as well as a continuous communication exchange with users, are integrated into the development of this system generation.
By means of eifeler-PVD technology, the following layers can be deposited reliably and in high quality on the systems:
Technique
Powerful vacuum pumps and strong radiation heaters guarantee a rapid conditioning of the tools and therefore short cycle times. The compact housing enables easy access to all important components. An optional plasma source for plasma nitriding or also the equipment with SPCS for the manufacture of “ultrafine” layers are extension possibilities for the alpha900P.
Batching system
The easy-to-use batching system allows the operator an optimal and reliable operating mode. voestalpine eifeler Vacotec offers a comprehensive program of batching means which can be used in all machines. Regardless of whether it involves cover sleeves for shaft tools, plug holders or rotation cups: We have a catalogue which is based on more than 25 years of experience in job coating.
Maintenance and service
The large chamber door offers optimum access for cleaning, loading and maintenance. Access to the data during the entire process is possible, as is the remote control for the online maintenance.
Technical data
Substrate | |
Material: | tool steel, HSS, cemented carbide, … |
Tool diameter: | Triple rotation max. Ø 40 mm |
Single rotation max. Ø 750 mm | |
Tool hight: | max. 880 mm |
Load: | max. 850 kg |
Coating chamber | |
Dimensions: | 1100 x 1100 x 1355 mm (L x W x H) |
Vacuum system | |
Rotary vane pump: | 65 m³/h |
Roots pump: | 500 m³/h |
Turbomolecular pump: | 2 x 1450 l/s |
Radiant heater | |
Power: | 4 x 15 kW |
Substrate temperature: | up to 500 °C |
2 x thermocouples | |
Bias power supply | |
Power: | 30 kW |
Voltage: | max. 1000 V DC / pulsed DC |
Arc-evaporator | |
Number: | 24 pieces |
Cathode diameter: | Ø 100 mm |
Current per cathode : | max. 125 A |
Power requirements | |
Mains: | TN-S 400/230 VAC / +-10% / 50 or 60 Hz |
Power: | 138 kVA |